Invention Grant
US08541150B2 Manufacturing method of polymer film with photonic crystal structure
有权
具有光子晶体结构的聚合物膜的制造方法
- Patent Title: Manufacturing method of polymer film with photonic crystal structure
- Patent Title (中): 具有光子晶体结构的聚合物膜的制造方法
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Application No.: US13049281Application Date: 2011-03-16
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Publication No.: US08541150B2Publication Date: 2013-09-24
- Inventor: Jui-Hsiang Liu
- Applicant: Jui-Hsiang Liu
- Applicant Address: TW Tainan
- Assignee: National Cheng Kung University
- Current Assignee: National Cheng Kung University
- Current Assignee Address: TW Tainan
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Priority: TW99128545A 20100825
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A manufacturing method of a polymer film with the photonic crystal structure includes a mixing step for at least mixing an achiral liquid crystal (LC), a chiral dopant, a monomer and a photo initiator together to form an LC-monomer mixture, at least one exposure step for exposing the LC-monomer mixture through a mask, at least one diffusion step for diffusing the monomer from the area around one of the exposure areas to the exposure area, and a LC removing step for removing the achiral LC to form the polymer film. By implementing the diffusion step after the exposure step, the polymerization rate of the monomers is enhanced so as to increase the proportion of the polymer in the polymer film and raise the imprint rate of chirality. Therefore, the polymer film can reveal stronger photonic crystal structure and property of Bragg reflection when it is not filled with any fluid.
Public/Granted literature
- US20120052421A1 MANUFACTURING METHOD OF POLYMER FILM WITH PHOTONIC CRYSTAL STRUCTURE Public/Granted day:2012-03-01
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