Invention Grant
US08541157B2 Resist composition, method of forming resist pattern, compound and acid generator including the same
有权
抗蚀剂组合物，形成抗蚀剂图案的方法，包括其的化合物和酸发生剂
- Patent Title: Resist composition, method of forming resist pattern, compound and acid generator including the same
- Patent Title (中): 抗蚀剂组合物，形成抗蚀剂图案的方法，包括其的化合物和酸发生剂
-
Application No.: US12567643Application Date: 2009-09-25
-
Publication No.: US08541157B2Publication Date: 2013-09-24
- Inventor: Akiya Kawaue , Yoshiyuki Utsumi , Sho Abe
- Applicant: Akiya Kawaue , Yoshiyuki Utsumi , Sho Abe
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2008-252212 20080930; JP2009-210857 20090911
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/039 ; G03F7/20 ; G03F7/30
Abstract:
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.
Public/Granted literature
- US20100081088A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE SAME Public/Granted day:2010-04-01
Information query
IPC分类:
