Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US13442334Application Date: 2012-04-09
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Publication No.: US08541259B2Publication Date: 2013-09-24
- Inventor: Takumi Ihara
- Applicant: Takumi Ihara
- Applicant Address: JP Yokohama
- Assignee: Fujitsu Semiconductor Limited
- Current Assignee: Fujitsu Semiconductor Limited
- Current Assignee Address: JP Yokohama
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2009-277846 20091207
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L21/48 ; H01L21/50

Abstract:
A disclosed semiconductor device includes a wiring board, a semiconductor element mounted on a principal surface of the wiring board with flip chip mounting, a first conductive pattern formed on the principal surface along at least an edge portion of the semiconductor element, a second conductive pattern formed on the principal surface along the first conductive pattern and away from the first conductive pattern, a passive element bridging between the first conductive pattern and the second conductive pattern on the principal surface of the wiring board, and a resin layer filling a space between the wiring board and the semiconductor chip, wherein the resin layer extends between the semiconductor element and the first conductive pattern on the principal surface of the wiring board.
Public/Granted literature
- US08673684B2 Semiconductor device and manufacturing method thereof Public/Granted day:2014-03-18
Information query
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