Invention Grant
US08541300B2 Method of manufacturing semiconductor device, semiconductor device thus manufactured, and semiconductor manufacturing apparatus 有权
制造半导体器件的方法,如此制造的半导体器件和半导体制造装置

Method of manufacturing semiconductor device, semiconductor device thus manufactured, and semiconductor manufacturing apparatus
Abstract:
A plurality of projections, respectively given later as cores of a plurality of external connection terminals, are formed first by selectively forming a curable resin layer over a protective insulating film; flat portions are then formed respectively on the top surfaces of the plurality of projections, by pressing a molding jig having a flat opposing surface onto the top surfaces of the plurality of projections, before the projections are cured; the plurality of projections are cured; and the plurality of external connection terminals, and the plurality of interconnects are formed, by selectively forming an electro-conductive film over the plurality of projections, the protective insulating film, and the plurality of electrode pads.
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