Invention Grant
- Patent Title: Laser processing method
- Patent Title (中): 激光加工方法
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Application No.: US13388716Application Date: 2011-07-19
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Publication No.: US08541319B2Publication Date: 2013-09-24
- Inventor: Hideki Shimoi , Keisuke Araki
- Applicant: Hideki Shimoi , Keisuke Araki
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2010-167400 20100726
- International Application: PCT/JP2011/066356 WO 20110719
- International Announcement: WO2012/014721 WO 20120202
- Main IPC: H01L21/268
- IPC: H01L21/268

Abstract:
A laser processing method comprises a laser light converging step of converging a laser light at a sheet-like object to be processed made of silicon so as to form a modified region within the object, and an etching step of anisotropically etching the object so as to thin the object to a target thickness and advancing the etching selectively along the modified region so as to form the object with a through hole tilted with respect to a thickness direction of the object after the laser light converging step, wherein the laser light converging step forms a first modified region as the modified region in a part corresponding to the through hole in the object and a second modified region as the modified region extending parallel to the thickness direction and joining with the first modified region in a part to be removed upon thinning by the anisotropic etching in the object, and wherein the etching step advances the etching selectively along the second modified region and then along the first modified region while thinning the object and completes forming the through hole when the object is at the target thickness.
Public/Granted literature
- US20120129359A1 LASER PROCESSING METHOD Public/Granted day:2012-05-24
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