Invention Grant
US08541523B2 Norbornene-type polymers, compositions thereof and lithographic process using such compositions
有权
降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法
- Patent Title: Norbornene-type polymers, compositions thereof and lithographic process using such compositions
- Patent Title (中): 降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法
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Application No.: US13079240Application Date: 2011-04-04
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Publication No.: US08541523B2Publication Date: 2013-09-24
- Inventor: Pramod Kandanarachchi , Kazuyoshi Fujita , Steven Smith , Larry F. Rhodes
- Applicant: Pramod Kandanarachchi , Kazuyoshi Fujita , Steven Smith , Larry F. Rhodes
- Applicant Address: US OH Brecksville
- Assignee: Promerus, LLC
- Current Assignee: Promerus, LLC
- Current Assignee Address: US OH Brecksville
- Agent Balaram Gupta; Michael W. Ferrell
- Main IPC: C08F4/46
- IPC: C08F4/46 ; C08K5/06
Abstract:
Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.
Public/Granted literature
- US20110244400A1 Norbornene-Type Polymers, Compositions Thereof and Lithographic Process Using Such Compositions Public/Granted day:2011-10-06
Information query
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