Invention Grant
US08541532B2 Silane compound, production method thereof, and resin composition containing silane compound
有权
硅烷化合物及其制造方法,含有硅烷化合物的树脂组合物
- Patent Title: Silane compound, production method thereof, and resin composition containing silane compound
- Patent Title (中): 硅烷化合物及其制造方法,含有硅烷化合物的树脂组合物
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Application No.: US12526002Application Date: 2008-02-07
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Publication No.: US08541532B2Publication Date: 2013-09-24
- Inventor: Takuo Sugioka
- Applicant: Takuo Sugioka
- Applicant Address: JP Osaka
- Assignee: Nippon Shokubai Co., Ltd.
- Current Assignee: Nippon Shokubai Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: JP2007-031177 20070209; JP2007-129633 20070515; JP2007-149576 20070605; JP2007-271791 20071018
- International Application: PCT/JP2008/052480 WO 20080207
- International Announcement: WO2008/099904 WO 20080821
- Main IPC: C08G77/26
- IPC: C08G77/26 ; C08F283/12

Abstract:
A siloxane compound comprising a structure unit formed by connecting at least one organic skeleton having an imido bond to a silicon atom forming a siloxane bond, wherein the silane compound is defined by the following average formula: XaYbZcSiOd. X denotes groups including an organic skeleton having an imido bond, represented by formula (1) in the specification; Z denotes an organic groups having no imido bond; Y denotes at least one of hydrogen, hydroxyl, halogen, and OR; R denotes at least one of alkyl, acyl, aryl, and unsaturated aliphatic residual groups and may have a substituent; a is ≦3 and >0; b is 0≦3; c is 0≦3; d is ≦2 and >0; and a+b+c+2d=4, R1 denotes at least one from aromatic, heterocyclic, and alicyclic rings; x and z independently ≧0 and ≦5; and y is 0 or 1.
Public/Granted literature
- US20100317774A1 SILANE COMPOUND, PRODUCTION METHOD THEREOF, AND RESIN COMPOSITION CONTAINING SILANE COMPOUND Public/Granted day:2010-12-16
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