Invention Grant
US08541532B2 Silane compound, production method thereof, and resin composition containing silane compound 有权
硅烷化合物及其制造方法,含有硅烷化合物的树脂组合物

  • Patent Title: Silane compound, production method thereof, and resin composition containing silane compound
  • Patent Title (中): 硅烷化合物及其制造方法,含有硅烷化合物的树脂组合物
  • Application No.: US12526002
    Application Date: 2008-02-07
  • Publication No.: US08541532B2
    Publication Date: 2013-09-24
  • Inventor: Takuo Sugioka
  • Applicant: Takuo Sugioka
  • Applicant Address: JP Osaka
  • Assignee: Nippon Shokubai Co., Ltd.
  • Current Assignee: Nippon Shokubai Co., Ltd.
  • Current Assignee Address: JP Osaka
  • Agency: Novak Druce Connolly Bove + Quigg LLP
  • Priority: JP2007-031177 20070209; JP2007-129633 20070515; JP2007-149576 20070605; JP2007-271791 20071018
  • International Application: PCT/JP2008/052480 WO 20080207
  • International Announcement: WO2008/099904 WO 20080821
  • Main IPC: C08G77/26
  • IPC: C08G77/26 C08F283/12
Silane compound, production method thereof, and resin composition containing silane compound
Abstract:
A siloxane compound comprising a structure unit formed by connecting at least one organic skeleton having an imido bond to a silicon atom forming a siloxane bond, wherein the silane compound is defined by the following average formula: XaYbZcSiOd. X denotes groups including an organic skeleton having an imido bond, represented by formula (1) in the specification; Z denotes an organic groups having no imido bond; Y denotes at least one of hydrogen, hydroxyl, halogen, and OR; R denotes at least one of alkyl, acyl, aryl, and unsaturated aliphatic residual groups and may have a substituent; a is ≦3 and >0; b is 0≦3; c is 0≦3; d is ≦2 and >0; and a+b+c+2d=4, R1 denotes at least one from aromatic, heterocyclic, and alicyclic rings; x and z independently ≧0 and ≦5; and y is 0 or 1.
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