Invention Grant
- Patent Title: Fluorine-containing polyfunctional silicon compound and method for producing fluorine-containing polyfunctional silicon compound
- Patent Title (中): 含氟多官能硅化合物和含氟多官能硅化合物的制造方法
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Application No.: US12867301Application Date: 2009-02-12
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Publication No.: US08541533B2Publication Date: 2013-09-24
- Inventor: Takayuki Ito
- Applicant: Takayuki Ito
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-030698 20080212
- International Application: PCT/JP2009/052323 WO 20090212
- International Announcement: WO2009/101986 WO 20090820
- Main IPC: C08G77/24
- IPC: C08G77/24

Abstract:
A fluorine-containing polyfunctional silicon compound represented by the following general formula (I), which is useful as a raw material for materials having high water repellency and excellent scratch resistance and water droplet sliding properties and which can be produced by a production method which is simple and easy and environmentally friendly, is provided. In the formula, Q represents an (n+m)-valent organic group having at least one fluorine atom; each of Rf1 and Rf2 independently represents a fluorine atom, a hydrogen atom or an alkyl group having at least one fluorine atom; R1 represents a hydroxyl group, an isocyanate group or a hydrolyzable group; R2 represents a hydrogen atom or a hydrocarbon group; k represents 0 or 1; n represents an integer of 2 or more; m represents an integer of 0 or more; a represents an integer of from 1 to 6; and b represents an integer of from 1 to 3.
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