Invention Grant
US08541533B2 Fluorine-containing polyfunctional silicon compound and method for producing fluorine-containing polyfunctional silicon compound 有权
含氟多官能硅化合物和含氟多官能硅化合物的制造方法

  • Patent Title: Fluorine-containing polyfunctional silicon compound and method for producing fluorine-containing polyfunctional silicon compound
  • Patent Title (中): 含氟多官能硅化合物和含氟多官能硅化合物的制造方法
  • Application No.: US12867301
    Application Date: 2009-02-12
  • Publication No.: US08541533B2
    Publication Date: 2013-09-24
  • Inventor: Takayuki Ito
  • Applicant: Takayuki Ito
  • Applicant Address: JP Tokyo
  • Assignee: FUJIFILM Corporation
  • Current Assignee: FUJIFILM Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2008-030698 20080212
  • International Application: PCT/JP2009/052323 WO 20090212
  • International Announcement: WO2009/101986 WO 20090820
  • Main IPC: C08G77/24
  • IPC: C08G77/24
Fluorine-containing polyfunctional silicon compound and method for producing fluorine-containing polyfunctional silicon compound
Abstract:
A fluorine-containing polyfunctional silicon compound represented by the following general formula (I), which is useful as a raw material for materials having high water repellency and excellent scratch resistance and water droplet sliding properties and which can be produced by a production method which is simple and easy and environmentally friendly, is provided. In the formula, Q represents an (n+m)-valent organic group having at least one fluorine atom; each of Rf1 and Rf2 independently represents a fluorine atom, a hydrogen atom or an alkyl group having at least one fluorine atom; R1 represents a hydroxyl group, an isocyanate group or a hydrolyzable group; R2 represents a hydrogen atom or a hydrocarbon group; k represents 0 or 1; n represents an integer of 2 or more; m represents an integer of 0 or more; a represents an integer of from 1 to 6; and b represents an integer of from 1 to 3.
Information query
Patent Agency Ranking
0/0