Invention Grant
US08541752B2 Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask 有权
使用光刻掩模产生的辐射分布的局部解析测量的装置和方法

  • Patent Title: Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
  • Patent Title (中): 使用光刻掩模产生的辐射分布的局部解析测量的装置和方法
  • Application No.: US13719021
    Application Date: 2012-12-18
  • Publication No.: US08541752B2
    Publication Date: 2013-09-24
  • Inventor: Rolf Freimann
  • Applicant: Carl Zeiss SMT GmbH
  • Applicant Address: DE Oberkochen
  • Assignee: Carl Zeiss SMT GmbH
  • Current Assignee: Carl Zeiss SMT GmbH
  • Current Assignee Address: DE Oberkochen
  • Agency: Sughrue Mion, PLLC
  • Main IPC: G01J1/24
  • IPC: G01J1/24 G03F7/00
Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
Abstract:
A method for locally resolved measurement of a radiation distribution (24) produced using a lithography mask (16) comprises providing a radiation converter (31, 131) having an at least two-dimensional arrangement of converter elements (32, 132) which can respectively be put in an active and a passive state, and are configured to convert incoming radiation in respect of its wavelength in the active state. The method further includes: manipulating the radiation converter (31, 131) several times such that respectively only a fraction of the converter elements (32, 132) adopts the active state, irradiating the radiation converter (31, 131) with the radiation distribution (24) after every manipulation of the radiation converter (31, 131) so that the active converter elements (32, 132) emit wavelength-converted measuring radiation (34), recording respective places of origin (54) of the measuring radiation at every irradiation with the radiation distribution (24).
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