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US08541782B2 Method for evaluating oxide semiconductor and method for manufacturing semiconductor device 有权
氧化物半导体的评价方法及半导体装置的制造方法

Method for evaluating oxide semiconductor and method for manufacturing semiconductor device
Abstract:
Many of the principles of an oxide semiconductor are still unclear and therefore there is no established method for evaluating an oxide semiconductor. Thus, an object is to provide a novel method for evaluating an oxide semiconductor. Carrier density is evaluated, and hydrogen concentration is also evaluated. Specifically, a MOS capacitor (a diode or a triode) is manufactured, and the C-V characteristics of the MOS capacitor are obtained. Then, the carrier density is estimated from the C-V characteristics obtained.
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