Invention Grant
US08541782B2 Method for evaluating oxide semiconductor and method for manufacturing semiconductor device
有权
氧化物半导体的评价方法及半导体装置的制造方法
- Patent Title: Method for evaluating oxide semiconductor and method for manufacturing semiconductor device
- Patent Title (中): 氧化物半导体的评价方法及半导体装置的制造方法
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Application No.: US12940724Application Date: 2010-11-05
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Publication No.: US08541782B2Publication Date: 2013-09-24
- Inventor: Shunpei Yamazaki , Akiharu Miyanaga , Tatsuya Honda
- Applicant: Shunpei Yamazaki , Akiharu Miyanaga , Tatsuya Honda
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2009-255230 20091106
- Main IPC: H01L23/58
- IPC: H01L23/58

Abstract:
Many of the principles of an oxide semiconductor are still unclear and therefore there is no established method for evaluating an oxide semiconductor. Thus, an object is to provide a novel method for evaluating an oxide semiconductor. Carrier density is evaluated, and hydrogen concentration is also evaluated. Specifically, a MOS capacitor (a diode or a triode) is manufactured, and the C-V characteristics of the MOS capacitor are obtained. Then, the carrier density is estimated from the C-V characteristics obtained.
Public/Granted literature
- US20110111535A1 METHOD FOR EVALUATING OXIDE SEMICONDUCTOR AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2011-05-12
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