Invention Grant
- Patent Title: Source of photons resulting from a recombination of localized excitons
- Patent Title (中): 由局部激子重组产生的光子的来源
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Application No.: US12968507Application Date: 2010-12-15
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Publication No.: US08541791B2Publication Date: 2013-09-24
- Inventor: Roch Espiau de Lamaestre , Jean-Jacques Greffet , Bernard Guillaumot , Ruben Esteban Llorente
- Applicant: Roch Espiau de Lamaestre , Jean-Jacques Greffet , Bernard Guillaumot , Ruben Esteban Llorente
- Applicant Address: FR Grenoble FR Paris
- Assignee: STMicroelectronics (Grenoble) SAS,Commissariat à l'Énergie Atomique et aux Énergies Alternatives Centre National de la Recherche Scientifique
- Current Assignee: STMicroelectronics (Grenoble) SAS,Commissariat à l'Énergie Atomique et aux Énergies Alternatives Centre National de la Recherche Scientifique
- Current Assignee Address: FR Grenoble FR Paris
- Agency: Wolf, Greenfield & Sacks, P.C.
- Priority: FR0959007 20091215
- Main IPC: H01L27/15
- IPC: H01L27/15

Abstract:
A source of photons resulting from a recombination of localized excitons, including a semiconductor layer having a central portion surrounded with heavily-doped regions; above said central portion, a layer portion containing elements capable of being activated by excitons, coated with a first metallization; and under the semiconductor layer, a second metallization of greater extension than the first metallization. The distance between the first and second metallizations is on the order of from 10 to 60 nm; and the lateral extension of the first metallization is on the order of from λ0/10*ne to λ0/2*ne, where λ0 is the wavelength in vacuum of the emitted light and ne is the effective refractive index of the mode formed in the cavity created by the two metallizations.
Public/Granted literature
- US20110204323A1 SOURCE OF PHOTONS RESULTING FROM A RECOMBINATION OF LOCALIZED EXCITONS Public/Granted day:2011-08-25
Information query
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