Invention Grant
- Patent Title: Process for production of DDR-type zeolite
- Patent Title (中): 生产DDR型沸石的方法
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Application No.: US13457838Application Date: 2012-04-27
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Publication No.: US08545802B2Publication Date: 2013-10-01
- Inventor: Tetsuya Uchikawa , Kenji Yajima
- Applicant: Tetsuya Uchikawa , Kenji Yajima
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown
- Priority: JP2009-280294 20091210
- Main IPC: C01B33/36
- IPC: C01B33/36 ; C01B39/00 ; C01F7/00

Abstract:
There is provided a process for producing a DDR-type zeolite having: a raw material solution preparation step of preparing a raw material solution containing 1-adamantaneamine hydrochloride, silica (SiO2), and water at a 1-adamantaneamine hydrochloride/SiO2 molar ratio of 0.002 to 0.5 and a water/SiO2 molar ratio of 10 to 500, and a crystal growth step of subjecting the raw material solution and a DDR-type zeolite powder to a heat treatment in a state that both the raw material solution and the DDR-type zeolite powder are brought into contact with each other to grow crystals of the DDR-type zeolite by the use of the DDR-type zeolite powder as seed crystals.
Public/Granted literature
- US20120213696A1 PROCESS FOR PRODUCTION OF DDR-TYPE ZEOLITE Public/Granted day:2012-08-23
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