Invention Grant
- Patent Title: Wafer-processing tape and method of producing the same
- Patent Title (中): 晶圆加工带及其制造方法
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Application No.: US11370835Application Date: 2006-03-09
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Publication No.: US08545979B2Publication Date: 2013-10-01
- Inventor: Kenji Kita , Yasumasa Morishima , Shinichi Ishiwata
- Applicant: Kenji Kita , Yasumasa Morishima , Shinichi Ishiwata
- Applicant Address: JP Tokyo
- Assignee: The Furukawa Electric Co., Ltd.
- Current Assignee: The Furukawa Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2003-416640 20031215
- Main IPC: B32B7/12
- IPC: B32B7/12 ; B32B7/10

Abstract:
A wafer-processing tape, which has an adhesive layer and a removable adhesive layer formed on a surface of a base film, and which has an area where B>A, and an area where A>B, in which a peeling force between the base film and the adhesive layer is designated as A, and peeling forces between a target to be bonded and the adhesive layer and between a target to be bonded and the removable adhesive layer are designated as B, wherein the adhesive layer is transferred onto the chip side during pickup in the area where B>A, and the removable adhesive layer is not transferred onto the target to be bonded in the area where A>B during peeling off the tape.
Public/Granted literature
- US20060154066A1 Wafer-processing tape and method of producing the same Public/Granted day:2006-07-13
Information query