Invention Grant
US08546061B2 Photo-curing polysiloxane composition and protective film formed from the same
有权
光固化聚硅氧烷组合物和由其形成的保护膜
- Patent Title: Photo-curing polysiloxane composition and protective film formed from the same
- Patent Title (中): 光固化聚硅氧烷组合物和由其形成的保护膜
-
Application No.: US13291305Application Date: 2011-11-08
-
Publication No.: US08546061B2Publication Date: 2013-10-01
- Inventor: Ming-Ju Wu , Chun-An Shih
- Applicant: Ming-Ju Wu , Chun-An Shih
- Applicant Address: TW Tainan
- Assignee: Chi Mei Corporation
- Current Assignee: Chi Mei Corporation
- Current Assignee Address: TW Tainan
- Agency: Fox Rothschild, LLP
- Agent Robert J. Sacco
- Priority: TW99141704A 20101201
- Main IPC: G03F7/022
- IPC: G03F7/022 ; G03F7/038 ; G03F7/075 ; G03F7/11

Abstract:
A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains 25 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 10,000 to 80,000 based on a total weight of the polysiloxane when calculated from an integral molecular weight distribution curve obtained by plotting cumulative weight percentage versus molecular weight falling within a range between 400 and 100,000 measured by gel permeation chromatography. The amount of oligomers in the polysiloxane having a molecular weight less than 800 is from 0 wt % to 10 wt % based on a total weight of the photo-curing polysiloxane composition. A protective film formed from the photo-curing polysiloxane composition and an element containing the protective film are also disclosed.
Public/Granted literature
- US20120141936A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME Public/Granted day:2012-06-07
Information query
IPC分类: