Invention Grant
US08546062B2 Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same
有权
自形成顶部抗反射涂料组合物和光致抗蚀剂混合物和使用其成像的方法
- Patent Title: Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same
- Patent Title (中): 自形成顶部抗反射涂料组合物和光致抗蚀剂混合物和使用其成像的方法
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Application No.: US13301841Application Date: 2011-11-22
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Publication No.: US08546062B2Publication Date: 2013-10-01
- Inventor: Wu-Song Huang , Irene Popova , Pushkara Rao Varanasi , Libor Vyklicky
- Applicant: Wu-Song Huang , Irene Popova , Pushkara Rao Varanasi , Libor Vyklicky
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Agent Joseph P. Abate
- Main IPC: C07C409/22
- IPC: C07C409/22 ; G03F7/039 ; G03F7/004
Abstract:
A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
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