Invention Grant
- Patent Title: Substrate for EUVL optical member
- Patent Title (中): EUVL光学元件基板
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Application No.: US13531928Application Date: 2012-06-25
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Publication No.: US08546283B2Publication Date: 2013-10-01
- Inventor: Junko Miyasaka , Akio Koike , Tomonori Ogawa
- Applicant: Junko Miyasaka , Akio Koike , Tomonori Ogawa
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-295221 20091225
- Main IPC: C03C3/06
- IPC: C03C3/06 ; C03C3/076 ; C03C3/112
Abstract:
The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO2, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.
Public/Granted literature
- US20120264584A1 SUBSTRATE FOR EUVL OPTICAL MEMBER Public/Granted day:2012-10-18
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