Invention Grant
- Patent Title: Charged particle beam device and sample observation method
- Patent Title (中): 带电粒子束装置和样品观察方法
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Application No.: US13515717Application Date: 2010-11-11
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Publication No.: US08546770B2Publication Date: 2013-10-01
- Inventor: Akinari Morikawa , Takeshi Sato , Eiko Nakazawa , Susumu Kuwabata
- Applicant: Akinari Morikawa , Takeshi Sato , Eiko Nakazawa , Susumu Kuwabata
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2009-282431 20091214
- International Application: PCT/JP2010/006640 WO 20101111
- International Announcement: WO2011/074178 WO 20110623
- Main IPC: H01J40/00
- IPC: H01J40/00 ; H01J47/00

Abstract:
There is provided a charged particle beam device which has a mechanism adjusting the shape of an ionic liquid droplet to be adhered to a sample and the thickness of a film of the ionic liquid, in such a manner that they are suitable for various types of observations by an electronic microscope and the like, and for processing using ion beams. The charged particle beam device is characterized in that it includes an ionic liquid holding member having an opening, an ionic liquid supplying unit for filling an ionic liquid into the opening, an observation unit for observing an adhesion state of the ionic liquid, and charged particle beam generating units for radiating charged particle beams, and can adjust the thickness of an ionic liquid droplet to be filled in the opening, when the charged particle beam device observes a sample in a state where it is floating in the ionic liquid by being dispersed into the ionic liquid or on a surface of the ionic liquid.
Public/Granted literature
- US20120292507A1 Charged Particle Beam Device and Sample Observation Method Public/Granted day:2012-11-22
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