Invention Grant
- Patent Title: Terminal structure for superjunction device and method of manufacturing the same
- Patent Title (中): 超结装置的端子结构及其制造方法
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Application No.: US13076289Application Date: 2011-03-30
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Publication No.: US08546882B2Publication Date: 2013-10-01
- Inventor: Shengan Xiao , Fei Wang , Yanping Liu
- Applicant: Shengan Xiao , Fei Wang , Yanping Liu
- Applicant Address: CN Shanghai
- Assignee: Shanghai Hua Hong NEC Electronics Co., Ltd.
- Current Assignee: Shanghai Hua Hong NEC Electronics Co., Ltd.
- Current Assignee Address: CN Shanghai
- Agency: Blakely Sokoloff Taylor & Zafman
- Priority: CN201010141072 20100406
- Main IPC: H01L21/331
- IPC: H01L21/331

Abstract:
A terminal structure for superjunction device is disclosed. The terminal structure comprises from inside out at least one P type implantation ring and several P type trench rings formed in an N type epitaxial layer to form alternating P type and N type regions. A channel cut-off ring is formed at the border of the device. The P type implantation ring is formed adjacent to the active area of the device and covers at least one trench ring. A terminal dielectric layer is formed to cover the P type implantation ring and the trench rings. A plurality of field plates are formed above the terminal dielectric layer. Methods of manufacturing terminal structure are also disclosed.
Public/Granted literature
- US20110241110A1 TERMINAL STRUCTURE FOR SUPERJUNCTION DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2011-10-06
Information query
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