Invention Grant
US08547518B2 Stage base, stage apparatus, exposure apparatus, and device manufacturing method
失效
舞台,舞台装置,曝光装置及装置的制造方法
- Patent Title: Stage base, stage apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 舞台,舞台装置,曝光装置及装置的制造方法
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Application No.: US11538985Application Date: 2006-10-05
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Publication No.: US08547518B2Publication Date: 2013-10-01
- Inventor: Kazuyuki Ono
- Applicant: Kazuyuki Ono
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2003-335643 20030926
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/58 ; G03B27/62 ; G03B27/42 ; G03B27/60

Abstract:
A stage base includes a plate which supports a stage. The plate has a first structure and a second structure, and the first and second structures are coupled. The stage base further includes a component which is arranged on the plate and has a cooling unit, a coolant channel arranged to extend through the plate into the component, and a seal member arranged between the first structure and the second structure so as to surround the coolant channel, an interior and an exterior of the seal member being fastened with a fastener.
Public/Granted literature
- US20070081142A1 STAGE BASE, STAGE APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2007-04-12
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