Invention Grant
- Patent Title: Exposing method, exposure apparatus, and device fabricating method
- Patent Title (中): 曝光方法，曝光装置和装置制造方法
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Application No.: US13529609Application Date: 2012-06-21
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Publication No.: US08547520B2Publication Date: 2013-10-01
- Inventor: Yosuke Shirata
- Applicant: Yosuke Shirata
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-351657 20051206
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/52
Abstract:
An exposure apparatus comprises: a first detection apparatus, which detects the temperature of a liquid after the liquid contacts a prescribed object; and a processing apparatus that detects the relationship between the temperature of the liquid and the temperature of the object based on the detection result of the first detection apparatus.
Public/Granted literature
- US20120262683A1 EXPOSING METHOD, EXPOSURE APPARATUS, AND DEVICE FABRICATING METHOD Public/Granted day:2012-10-18
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