Invention Grant
- Patent Title: Non-volatile memory device and methods for manufacturing the same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US13338273Application Date: 2011-12-28
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Publication No.: US08547728B2Publication Date: 2013-10-01
- Inventor: Chrong-Jung Lin , Ya-Chin King
- Applicant: Chrong-Jung Lin , Ya-Chin King
- Applicant Address: TW Hsinchu TW Taipei
- Assignee: Chrong-Jung Lin,Ya-Chin King
- Current Assignee: Chrong-Jung Lin,Ya-Chin King
- Current Assignee Address: TW Hsinchu TW Taipei
- Agency: CKC & Partners Co., Ltd.
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A variable and reversible resistive element includes a transition metal oxide layer, a bottom electrode and at least one conductive plug module. The bottom electrode is disposed under the transition metal oxide layer. The conductive plug module is disposed on the transition metal oxide layer. The conductive plug module includes a metal plug and a barrier layer. The conductive plug is electrically connected with the transition metal oxide layer. The barrier layer surrounds the metal plug, wherein the transition metal oxide layer is made by reacting a portion of a dielectric layer being directly below the metal plug and a portion of the barrier layer contacting the portion of the dielectric layer, wherein the dielectric layer is formed on the bottom electrode. Moreover, a non-volatile memory device and methods for operating and manufacturing the same is disclosed in specification.
Public/Granted literature
- US20120091424A1 NON-VOLATILE MEMORY DEVICE AND METHODS FOR MANUFACTURING THE SAME Public/Granted day:2012-04-19
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