Invention Grant
- Patent Title: Methods for manufacturing piezoelectric devices
- Patent Title (中): 制造压电元件的方法
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Application No.: US13214074Application Date: 2011-08-19
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Publication No.: US08549717B2Publication Date: 2013-10-08
- Inventor: Ryoichi Ichikawa
- Applicant: Ryoichi Ichikawa
- Applicant Address: JP Tokyo
- Assignee: Nihon Dempa Kogyo Co., Ltd.
- Current Assignee: Nihon Dempa Kogyo Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Klarquist Sparkman, LLP
- Priority: JP2010-186785 20100824
- Main IPC: H04R17/10
- IPC: H04R17/10 ; H01L41/053

Abstract:
Methods are provided for manufacturing piezoelectric vibrating devices that do not contain any unwanted gas or water vapor inside the devices. In an exemplary method, a base wafer is prepared including multiple package bases each having a first main surface and a second main surface. The base wafer also includes a pair of through-holes disposed between adjacent package bases of the base wafer. A piezoelectric vibrating piece is placed on each package base. A lid wafer is prepared that includes multiple package lids. A sealing material is applied to the base wafer or lid wafer in peripheral bands used for bonding the bases and lids together and defines respective interior cavities. The band of sealing material includes a communicating groove that communicates from the inner cavity to the first through-hole. The base wafer and lid wafer are subject to heat and compression to effect bonding. Meanwhile, the cavities are allowed to ventilate through the communicating grooves and through-holes to ensure that the cavities have a desired vacuum level or inert gas contents before completion of sealing.
Public/Granted literature
- US20120049695A1 PIEZOELECTRIC VIBRATING DEVICES AND METHODS FOR MANUFACTURING SAME Public/Granted day:2012-03-01
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