Invention Grant
US08549937B2 Method for determining COP generation factors for single-crystal silicon wafer
有权
用于确定单晶硅晶片的COP生成因子的方法
- Patent Title: Method for determining COP generation factors for single-crystal silicon wafer
- Patent Title (中): 用于确定单晶硅晶片的COP生成因子的方法
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Application No.: US13660299Application Date: 2012-10-25
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Publication No.: US08549937B2Publication Date: 2013-10-08
- Inventor: Shuichi Inami
- Applicant: Shuichi Inami
- Applicant Address: JP Tokyo
- Assignee: Sumco Corporation
- Current Assignee: Sumco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Clark & Brody
- Priority: JP2006-158488 20060607
- Main IPC: G01N21/88
- IPC: G01N21/88

Abstract:
A whole determination area of a targeted wafer is concentrically divided in a radial direction, COP density is obtained in each divided determination segment, a maximum value of the COP density is set as COP densityRADIUSMAX, a minimum value of the COP density is set as COP densityRADIUSMIN, a value computed by “(COP densityRADIUSMAX-COP densityRADIUSMIN)/COP densityRADIUSMAX” is compared to a predetermined set value, and a non-crystal-induced COP and a crystal-induced COP are distinguished from each other based on a clear criterion, thereby determining the COP generation factor. Therefore, a rejected wafer in which a determination of the crystal-induced COP is made despite being the non-crystal-induced COP can be relieved, so that a wafer production yield can be enhanced.
Public/Granted literature
- US20130054152A1 METHOD FOR DETERMINING COP GENERATION FACTORS FOR SINGLE-CRYSTAL SILICON WAFER Public/Granted day:2013-02-28
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