Invention Grant
US08549937B2 Method for determining COP generation factors for single-crystal silicon wafer 有权
用于确定单晶硅晶片的COP生成因子的方法

  • Patent Title: Method for determining COP generation factors for single-crystal silicon wafer
  • Patent Title (中): 用于确定单晶硅晶片的COP生成因子的方法
  • Application No.: US13660299
    Application Date: 2012-10-25
  • Publication No.: US08549937B2
    Publication Date: 2013-10-08
  • Inventor: Shuichi Inami
  • Applicant: Shuichi Inami
  • Applicant Address: JP Tokyo
  • Assignee: Sumco Corporation
  • Current Assignee: Sumco Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Clark & Brody
  • Priority: JP2006-158488 20060607
  • Main IPC: G01N21/88
  • IPC: G01N21/88
Method for determining COP generation factors for single-crystal silicon wafer
Abstract:
A whole determination area of a targeted wafer is concentrically divided in a radial direction, COP density is obtained in each divided determination segment, a maximum value of the COP density is set as COP densityRADIUSMAX, a minimum value of the COP density is set as COP densityRADIUSMIN, a value computed by “(COP densityRADIUSMAX-COP densityRADIUSMIN)/COP densityRADIUSMAX” is compared to a predetermined set value, and a non-crystal-induced COP and a crystal-induced COP are distinguished from each other based on a clear criterion, thereby determining the COP generation factor. Therefore, a rejected wafer in which a determination of the crystal-induced COP is made despite being the non-crystal-induced COP can be relieved, so that a wafer production yield can be enhanced.
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