Invention Grant
- Patent Title: Method and apparatus for manipulating a substrate
- Patent Title (中): 用于操纵衬底的方法和装置
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Application No.: US13268139Application Date: 2011-10-07
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Publication No.: US08550520B2Publication Date: 2013-10-08
- Inventor: John Robert Fairhurst , Jeffrey E. Krampert , Richard J. Hertel
- Applicant: John Robert Fairhurst , Jeffrey E. Krampert , Richard J. Hertel
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: B66C1/00
- IPC: B66C1/00 ; B66C1/54

Abstract:
A device is disclosed for manipulating a substrate having an inside diameter (ID). The device includes a handle, a trigger that slides within the handle, an alignment shaft and a plurality of substrate supports having distal ends. A plurality of substrate support actuators are connected to the trigger. The trigger can move the plurality of substrate supports between a substrate engaging position and a substrate releasing position through selective engagement of the plurality of substrate supports by the plurality of substrate support actuators. In the substrate engaging position the distal ends of the substrate supports move radially outward to engage the ID of the substrate, enabling the device to hold the substrate without touching the substrate faces. Other embodiments are described and claimed.
Public/Granted literature
- US20130088030A1 METHOD AND APPARATUS FOR MANIPULATING A SUBSTRATE Public/Granted day:2013-04-11
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