Invention Grant
US08550601B2 Use of photoresist material as an interstitial fill for PZT printhead fabrication
有权
使用光致抗蚀剂材料作为PZT打印头制造的间隙填充
- Patent Title: Use of photoresist material as an interstitial fill for PZT printhead fabrication
- Patent Title (中): 使用光致抗蚀剂材料作为PZT打印头制造的间隙填充
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Application No.: US13069732Application Date: 2011-03-23
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Publication No.: US08550601B2Publication Date: 2013-10-08
- Inventor: Mark A. Cellura , Peter J. Nystrom , Kock-yee Law , John Paul Meyers , Gary Daniel Redding , Yuanjia Zhang
- Applicant: Mark A. Cellura , Peter J. Nystrom , Kock-yee Law , John Paul Meyers , Gary Daniel Redding , Yuanjia Zhang
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: US CT Norwalk
- Agency: MH2 Technology Law Group LLP
- Main IPC: B41J2/045
- IPC: B41J2/045
Abstract:
An ink jet printhead including a plurality of piezoelectric elements and a photosensitive interstitial layer which fills spaces between each adjacent piezoelectric element. The ink jet printhead can be formed using a simplified method to pattern the photosensitive interstitial layer, and to remove a diaphragm attach material which covers a plurality of openings through a diaphragm using laser ablation.
Public/Granted literature
- US20120242758A1 USE OF PHOTORESIST MATERIAL AS AN INTERSTITIAL FILL FOR PZT PRINTHEAD FABRICATION Public/Granted day:2012-09-27
Information query
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