Invention Grant
- Patent Title: Showerhead for CVD depositions
- Patent Title (中): 用于CVD沉积的喷头
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Application No.: US13025035Application Date: 2011-02-10
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Publication No.: US08551248B2Publication Date: 2013-10-08
- Inventor: Brian E. Goodlin , Qidu Jiang
- Applicant: Brian E. Goodlin , Qidu Jiang
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent Rose Alyssa Keagy; W. James Brady; Frederick J. Telecky, Jr.
- Main IPC: C23C16/00
- IPC: C23C16/00
Abstract:
A CVD showerhead that includes a circular inner showerhead and at least one outer ring showerhead. At least two process gas delivery tubes are coupled to each showerhead. Also, a dual showerhead that includes a circular inner showerhead and at least one outer ring showerhead where each showerhead is coupled to oxygen plus a gas mixture of lead, zirconium, and titanium organometallics. A method of depositing a CVD thin film on a wafer. Also, a method of depositing a PZT thin film on a wafer.
Public/Granted literature
- US20110256729A1 Showerhead for CVD Depositions Public/Granted day:2011-10-20
Information query
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