Invention Grant
US08551251B2 Ultrasonic treatment method and apparatus 有权
超声波处理方法及装置

Ultrasonic treatment method and apparatus
Abstract:
Improved methods and apparatus for cleaning substrates and enhancing diffusion limited reaction at substrate surfaces use piezoelectric transducers operating in the gigasonic domain. The resonator assemblies include plural transducer stacks each including a thin film piezoelectric element coupled to a resonator plate that faces the substrate. At the disclosed frequencies and powers used, Eckart or Rayleigh streaming can be induced in a liquid treatment medium without substantial generation of cavitation.
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