Invention Grant
- Patent Title: Methods of producing hydrochloric acid from hydrogen gas and chlorine gas
- Patent Title (中): 从氢气和氯气生产盐酸的方法
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Application No.: US12790613Application Date: 2010-05-28
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Publication No.: US08551299B2Publication Date: 2013-10-08
- Inventor: Majid Keshavarz , Saroj Kumar Sahu , Chockkalingam Karuppaiah , Ge Zu , Suresh Kumar Surapalan Nair , Vasanthan Mani
- Applicant: Majid Keshavarz , Saroj Kumar Sahu , Chockkalingam Karuppaiah , Ge Zu , Suresh Kumar Surapalan Nair , Vasanthan Mani
- Applicant Address: US CA Fremont
- Assignee: Deeya Energy, Inc.
- Current Assignee: Deeya Energy, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Haynes and Boone LLP
- Main IPC: C01B7/01
- IPC: C01B7/01 ; H01M6/50 ; H01M6/04

Abstract:
A method of producing HCl from H2 and Cl2 is provided. In some embodiments, the method comprises at least one photochemical chamber placed in fluid communication with at least one source of H2 and at least one source of Cl2. In some embodiments, the photochemical chamber effects the formation of HCl through the use of at least one source of ultraviolet radiation contained therein. In some embodiments, the HCl product may be captured and used as a gas. In some embodiments, the HCl product may be absorbed into water to form an aqueous HCl solution.
Public/Granted literature
- US20110081561A1 METHODS OF PRODUCING HYDROCHLORIC ACID FROM HYDROGEN GAS AND CHLORINE GAS Public/Granted day:2011-04-07
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