Invention Grant
- Patent Title: Film forming method and film forming apparatus
- Patent Title (中): 成膜方法和成膜装置
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Application No.: US12811185Application Date: 2008-12-25
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Publication No.: US08551565B2Publication Date: 2013-10-08
- Inventor: Isao Gunji , Hidenori Miyoshi , Hitoshi Itoh
- Applicant: Isao Gunji , Hidenori Miyoshi , Hitoshi Itoh
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2008-000680 20080107
- International Application: PCT/JP2008/073546 WO 20081225
- International Announcement: WO2009/087906 WO 20090716
- Main IPC: C23C16/18
- IPC: C23C16/18
Abstract:
Disclosed is a film forming method including the steps of: producing a monovalent carboxylic acid metal salt gas by reacting a bivalent carboxylic acid metal salt with a carboxylic acid; supplying the monovalent carboxylic acid metal salt gas on a substrate to accumulate a monovalent carboxylic acid metal salt film; and decomposing the monovalent carboxylic acid metal salt film by supplying energy to the substrate formed with the monovalent carboxylic acid metal salt film so as to form a metallic film.
Public/Granted literature
- US20100316799A1 FILM FORMING METHOD AND FILM FORMING APPARATUS Public/Granted day:2010-12-16
Information query
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