Invention Grant
- Patent Title: Dicing a semiconductor wafer
- Patent Title (中): 切割半导体晶圆
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Application No.: US12989937Application Date: 2009-04-30
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Publication No.: US08551792B2Publication Date: 2013-10-08
- Inventor: Adrian Boyle , Joseph Callaghan , Fintan McKiernan
- Applicant: Adrian Boyle , Joseph Callaghan , Fintan McKiernan
- Applicant Address: US OR Portland
- Assignee: Electro Scientific Industries, Inc.
- Current Assignee: Electro Scientific Industries, Inc.
- Current Assignee Address: US OR Portland
- Agency: Stoel Rives LLP
- Priority: GB0807780.2 20080430
- International Application: PCT/EP2009/055274 WO 20090430
- International Announcement: WO2009/133174 WO 20091105
- Main IPC: H01L21/301
- IPC: H01L21/301 ; H01L21/66

Abstract:
A method of dicing a semiconductor wafer comprises scribing at least one dielectric layer along dice lanes to remove material from a surface of the wafer using a laser with a pulse-width between 1 picosecond and 1000 picoseconds and with a repetition frequency corresponding to times between pulses shorter than a thermal relaxation time of the material to be scribed. The wafer is then diced through a metal layer and at least partially through a substrate of the semiconductor wafer.
Public/Granted literature
- US20120064695A1 DICING A SEMICONDUCTOR WAFER Public/Granted day:2012-03-15
Information query
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