Invention Grant
US08552415B2 Solid-state imaging device, method for manufacturing solid-state imaging device, and imaging apparatus 有权
固态成像装置,制造固态成像装置的方法和成像装置

  • Patent Title: Solid-state imaging device, method for manufacturing solid-state imaging device, and imaging apparatus
  • Patent Title (中): 固态成像装置,制造固态成像装置的方法和成像装置
  • Application No.: US12692982
    Application Date: 2010-01-25
  • Publication No.: US08552415B2
    Publication Date: 2013-10-08
  • Inventor: Atsushi Toda
  • Applicant: Atsushi Toda
  • Applicant Address: JP
  • Assignee: Sony Corporation
  • Current Assignee: Sony Corporation
  • Current Assignee Address: JP
  • Agency: Sheridan Ross P.C.
  • Priority: JP2009-017470 20090129
  • Main IPC: H01L31/18
  • IPC: H01L31/18
Solid-state imaging device, method for manufacturing solid-state imaging device, and imaging apparatus
Abstract:
A solid-state imaging device includes a first electrode, a second electrode disposed opposing to the first electrode, and a photoelectric conversion layer, which is disposed between the first electrode and the second electrode and in which narrow gap semiconductor quantum dots are dispersed in a conductive layer, wherein one electrode of the first electrode and the second electrode is formed from a transparent electrode and the other electrode is formed from a metal electrode or a transparent electrode.
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