Invention Grant
- Patent Title: Micro-electro-mechanical device and manufacturing method for the same
- Patent Title (中): 微机电装置及其制造方法相同
-
Application No.: US13287150Application Date: 2011-11-02
-
Publication No.: US08552473B2Publication Date: 2013-10-08
- Inventor: Fuminori Tateishi , Konami Izumi , Mayumi Yamaguchi
- Applicant: Fuminori Tateishi , Konami Izumi , Mayumi Yamaguchi
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2005-258072 20050906
- Main IPC: H01L29/786
- IPC: H01L29/786
Abstract:
It is an object of the present invention to provide a micro-electro-mechanical-device having a microstructure and a semiconductor element over one surface. In particular, it is an object of the present invention to provide a method for simplifying the process of forming the microstructure and the semiconductor element over one surface. A space in which the microstructure is moved, that is, a movable space for the microstructure is formed by processsing an insulating layer which is formed in a process of forming the semiconductor element. The movable space can be formed by forming the insulating layer having a plurality of openings and making the openings face each other to be overlapped each other.
Public/Granted literature
- US20120043594A1 Micro-Electro-Mechanical Device And Manufacturing Method For The Same Public/Granted day:2012-02-23
Information query
IPC分类:
