Invention Grant
- Patent Title: High-voltage vertical transistor with edge termination structure
- Patent Title (中): 具有边缘端接结构的高压立式晶体管
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Application No.: US12807016Application Date: 2010-08-26
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Publication No.: US08552496B2Publication Date: 2013-10-08
- Inventor: Donald Ray Disney
- Applicant: Donald Ray Disney
- Applicant Address: US CA San Jose
- Assignee: Power Integrations, Inc.
- Current Assignee: Power Integrations, Inc.
- Current Assignee Address: US CA San Jose
- Agency: The Law Offices of Bradley J. Bereznak
- Main IPC: H01L27/088
- IPC: H01L27/088

Abstract:
A high-voltage transistor includes a drain, a source, and one or more drift regions extending from the drain toward the source. A field plate member laterally surrounds the drift regions and is insulated from the drift regions by a dielectric layer. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Public/Granted literature
- US20110018058A1 High-voltage vertical transistor with edge termination structure Public/Granted day:2011-01-27
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