Invention Grant
- Patent Title: Apparatus for measuring conductive pattern on substrate
- Patent Title (中): 用于测量衬底上的导电图案的装置
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Application No.: US12981282Application Date: 2010-12-29
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Publication No.: US08552732B2Publication Date: 2013-10-08
- Inventor: Yong-Tong Zou , Ding-Kun Liu , Hau-Wei Wang , Chih-Hsiang Chan
- Applicant: Yong-Tong Zou , Ding-Kun Liu , Hau-Wei Wang , Chih-Hsiang Chan
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Priority: TW99125577A 20100802
- Main IPC: G01R31/00
- IPC: G01R31/00

Abstract:
An embodiment of the invention provides an apparatus for measuring a conductive pattern on a substrate, which includes a first electro-optical modulator surrounding at least one first detecting roller; transmission rollers for transferring the substrate and allowing direct contact of the substrate and the first electro-optical modulator; a voltage supplier for providing a bias between the first electro-optical modulator and the substrate; and a first image detecting system for receiving a first detecting light reflected from a first surface of the substrate.
Public/Granted literature
- US20120025839A1 APPARATUS FOR MEASURING CONDUCTIVE PATTERN ON SUBSTRATE Public/Granted day:2012-02-02
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