Invention Grant
- Patent Title: Glyph rendering
- Patent Title (中): 雕文渲染
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Application No.: US13304119Application Date: 2011-11-23
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Publication No.: US08553032B1Publication Date: 2013-10-08
- Inventor: Timothy Poston
- Applicant: Timothy Poston
- Applicant Address: US NY New York
- Assignee: Animoto, Inc.
- Current Assignee: Animoto, Inc.
- Current Assignee Address: US NY New York
- Agency: Hickman Palermo Truong Becker Bingham Wong LLP
- Main IPC: G06T15/30
- IPC: G06T15/30 ; G06T17/20

Abstract:
Techniques are provided for glyph rendering based on a polygon mesh having vertices located away from a glyph's outline. Skeletonisation may be used to establish polygonal skeletons in the interior region of a glyph and in the outside region of the glyph. Transepts oriented away from the glyph's outline may be generated for nodes on the glyph's outline. A polygon mesh may be generated with vertices constrained to be selected from a set of candidate vertices comprising termination points of transepts, skeleton nodes, and/or points on the glyph's bounding boxes. Implicit forms may be determined from curves or lines representing segments of the glyph's outline, without use of Bézier control points and endpoints. These implicit forms along with tessellation data may be provided to a computing device as glyph rendering data for rendering the glyph at runtime.
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