Invention Grant
- Patent Title: Manufacturing method of an array substrate including a four step process
- Patent Title (中): 包括四步法的阵列基片的制造方法
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Application No.: US12702495Application Date: 2010-02-09
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Publication No.: US08553184B2Publication Date: 2013-10-08
- Inventor: Xuesong Gao
- Applicant: Xuesong Gao
- Applicant Address: CN Beijing
- Assignee: Beijing Boe Optoelectronics Technology Co., Ltd.
- Current Assignee: Beijing Boe Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN200910077351 20090218
- Main IPC: G02F1/1335
- IPC: G02F1/1335 ; G02F1/13

Abstract:
An array substrate, comprising a substrate and a data line and a gate line formed on the substrate. The data line and gate line cross each other to define a pixel region and the pixel region comprises a reflective region and a transparent region. The pixel region further comprises: a pixel electrode, formed with a transparent conductive film on the substrate and provided at least in the transparent region; a thin film transistor, formed on the substrate, the transparent conductive film being retained below the gate line and a gate electrode of the thin film transistor; a planarization film, covering the thin film transistor on the substrate; and a reflective layer, formed on the planarization film and disposed in the reflective region of the pixel region. A method of manufacturing the array substrate is provided.
Public/Granted literature
- US20100208155A1 ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF AND LIQUID CRYSTAL DISPLAY Public/Granted day:2010-08-19
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