Invention Grant
- Patent Title: Projection objective for microlithography
- Patent Title (中): 微光刻的投影目标
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Application No.: US12724496Application Date: 2010-03-16
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Publication No.: US08553202B2Publication Date: 2013-10-08
- Inventor: Jens Kugler , Tilman Schwertner
- Applicant: Jens Kugler , Tilman Schwertner
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102007047109 20071001
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42

Abstract:
An optical system includes an optical element having adjusting elements. The optical element is connected to a rotatable carrying ring via at least one connecting member arranged on the carrying ring directly or via one or a plurality of intermediate elements to the optical element. The rotatable carrying ring is borne in a manner freely rotatable about an axis relative to a fixed outer mount or the optical element via a rotating device. The outer mount, the rotatable carrying ring and the connecting members are constructed as rotatable kinematics in the form of parallel kinematics.
Public/Granted literature
- US20100201964A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY Public/Granted day:2010-08-12
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