Invention Grant
US08553202B2 Projection objective for microlithography 有权
微光刻的投影目标

Projection objective for microlithography
Abstract:
An optical system includes an optical element having adjusting elements. The optical element is connected to a rotatable carrying ring via at least one connecting member arranged on the carrying ring directly or via one or a plurality of intermediate elements to the optical element. The rotatable carrying ring is borne in a manner freely rotatable about an axis relative to a fixed outer mount or the optical element via a rotating device. The outer mount, the rotatable carrying ring and the connecting members are constructed as rotatable kinematics in the form of parallel kinematics.
Public/Granted literature
Information query
Patent Agency Ranking
0/0