Invention Grant
US08553333B2 Nanostructured anti-reflective coatings for substrates 有权
用于基材的纳米结构抗反射涂层

Nanostructured anti-reflective coatings for substrates
Abstract:
Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of anti-reflective films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate to form a nanostructured, anti-reflective coating. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. In some embodiments, a scratch-resistant, anti-reflective coating is applied to a polycarbonate substrate, such as a lens. In certain embodiments, an anti-reflective coating is applied to a surface of a solar catalytic microreactor suitable for performing endothermic reactions, where energy is provided to the reactor by absorption of solar radiation. The composition and morphology of the material deposited on a substrate can be tailored. The process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.
Public/Granted literature
Information query
Patent Agency Ranking
0/0