Invention Grant
- Patent Title: Nanostructured anti-reflective coatings for substrates
- Patent Title (中): 用于基材的纳米结构抗反射涂层
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Application No.: US13189411Application Date: 2011-07-22
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Publication No.: US08553333B2Publication Date: 2013-10-08
- Inventor: Chih-hung Chang , Seung-Yeol Han , Brian K. Paul
- Applicant: Chih-hung Chang , Seung-Yeol Han , Brian K. Paul
- Applicant Address: US OR Corvallis
- Assignee: State of Oregon acting by and through the State Board of Higher Education on behalf of Oregon State University
- Current Assignee: State of Oregon acting by and through the State Board of Higher Education on behalf of Oregon State University
- Current Assignee Address: US OR Corvallis
- Agency: Klarquist Sparkman, LLP
- Main IPC: G02B27/10
- IPC: G02B27/10 ; B32B5/16

Abstract:
Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of anti-reflective films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate to form a nanostructured, anti-reflective coating. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. In some embodiments, a scratch-resistant, anti-reflective coating is applied to a polycarbonate substrate, such as a lens. In certain embodiments, an anti-reflective coating is applied to a surface of a solar catalytic microreactor suitable for performing endothermic reactions, where energy is provided to the reactor by absorption of solar radiation. The composition and morphology of the material deposited on a substrate can be tailored. The process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.
Public/Granted literature
- US20120176681A1 NANOSTRUCTURED ANTI-REFLECTIVE COATINGS FOR SUBSTRATES Public/Granted day:2012-07-12
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