Invention Grant
- Patent Title: High aspect ratio motion limiter of a microactuator and method for fabrication
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Application No.: US11986245Application Date: 2007-11-19
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Publication No.: US08553368B2Publication Date: 2013-10-08
- Inventor: Toshiki Hirano , Haruhide Takahashi
- Applicant: Toshiki Hirano , Haruhide Takahashi
- Applicant Address: NL Amsterdam
- Assignee: HGST Netherlands B.V.
- Current Assignee: HGST Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Main IPC: G11B21/24
- IPC: G11B21/24 ; G11B5/56
Abstract:
A high-aspect ratio motion limiter of a microactuator and a method for fabrication are disclosed. In one embodiment, at least one low-aspect ratio gap is created in a substrate of a microactuator of a hard disk drive. The low-aspect ratio gap is then utilized to facilitate the creation of a high-aspect ratio motion limiter in the substrate of the microactuator.
Public/Granted literature
- US20090128950A1 High aspect ratio motion limiter of a microactuator and method for fabrication Public/Granted day:2009-05-21
Information query
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