Invention Grant
US08553735B2 Device and method for material processing by means of laser radiation
有权
通过激光辐射进行材料加工的装置和方法
- Patent Title: Device and method for material processing by means of laser radiation
- Patent Title (中): 通过激光辐射进行材料加工的装置和方法
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Application No.: US11786421Application Date: 2007-04-11
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Publication No.: US08553735B2Publication Date: 2013-10-08
- Inventor: Mark Bischoff , Dirk Muehlhoff , Gregor Stobrawa
- Applicant: Mark Bischoff , Dirk Muehlhoff , Gregor Stobrawa
- Applicant Address: DE Jena
- Assignee: Carl Zeiss Meditec AG
- Current Assignee: Carl Zeiss Meditec AG
- Current Assignee Address: DE Jena
- Agency: Patterson Thuente Pedersen, P.A.
- Main IPC: H01S3/10
- IPC: H01S3/10 ; A61B18/18

Abstract:
In a device for material processing by means of laser radiation, said device comprising a source of laser radiation emitting pulsed laser radiation for interaction with the material; optics focusing the pulsed processing laser radiation to a center of interaction in the material; a scanning unit shifting the positions of the center of interaction within the material, wherein each processing laser pulse interacts with the material in a zone surrounding the center of interaction assigned to said laser pulse so that material is separated in the zones of interaction; and a control unit which controls the scanning unit and the source of laser radiation such that a cut surface is produced in the material by sequential arrangement of zones of interaction, it is envisaged that the control unit controls the source of laser radiation and the scanning unit such that adjacent centers of interaction are located at a spatial distance a ≦10 μm from each other.
Public/Granted literature
- US20080212623A1 Device and method for material processing by means of laser radiation Public/Granted day:2008-09-04
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