Invention Grant
- Patent Title: System and method for generating spatial signatures
- Patent Title (中): 用于生成空间签名的系统和方法
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Application No.: US13585730Application Date: 2012-08-14
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Publication No.: US08553970B2Publication Date: 2013-10-08
- Inventor: Ditza Auerbach
- Applicant: Ditza Auerbach
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A system and method for performing spatial signature analysis, the system including a memory unit for storing wafer defect density maps of multiple resolutions, derived from a defect map obtained by an inspection tool; an analyzer for analyzing the wafer defect density maps to identify zones of interest; and a spatial signature generator for generating spatial signatures in response to relations between zones of interest of different density resolution.
Public/Granted literature
- US20130051653A1 System and method for generating spatial signatures Public/Granted day:2013-02-28
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