Invention Grant
- Patent Title: Exposure apparatus and device manufacturing method
- Patent Title (中): 曝光装置和装置制造方法
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Application No.: US12617576Application Date: 2009-11-12
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Publication No.: US08558986B2Publication Date: 2013-10-15
- Inventor: Keiji Yoshimura
- Applicant: Keiji Yoshimura
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2008-292606 20081114
- Main IPC: G03B27/68
- IPC: G03B27/68

Abstract:
An apparatus comprises a controller configured to generate a first list of measurement points arranged symmetrically with respect to a center of a shot region along a direction of scanning at a predetermined pitch, and a control by the controller includes a first control which causes a measurement device to measure a position of a surface with respect to each measurement point included in the first list, and a second control which causes the measurement device to measure the position with respect to each measurement point included in a second list obtained by excluding, from the first list, at least one of a measurement point with respect to which measurement is performed last in a first shot region and a measurement point with respect to which measurement is performed first in a second shot region next to the first shot region.
Public/Granted literature
- US20100123884A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-05-20
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