Invention Grant
- Patent Title: Defect inspection apparatus and method utilizing multiple inspection conditions
- Patent Title (中): 使用多种检查条件的缺陷检查装置和方法
-
Application No.: US12078097Application Date: 2008-03-27
-
Publication No.: US08558999B2Publication Date: 2013-10-15
- Inventor: Koji Kawaki , Atsushi Takane , Hiroshi Kikuchi , Nobuhiro Obara , Yuji Inoue
- Applicant: Koji Kawaki , Atsushi Takane , Hiroshi Kikuchi , Nobuhiro Obara , Yuji Inoue
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-084680 20070328
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
To provide a defect inspection apparatus and method adapted to easily assign threshold levels to scattered-light detectors and to appropriately acquire data detected by each scattered-light detector. The apparatus includes a stage device on which to rest a sample; a laser light irradiation device that irradiates the sample on the stage device with inspection light; scattered-light detectors, each of which detects a beam of light, scattered from the sample, and outputs an image signal; a threshold level setter formed so that an associated threshold level for judging whether defects are present is set only for an image signal selected from individual image signals of the scattered-light detectors or from image signals obtained by arithmetic processing based on the image signals, and a threshold level setting circuit that acquires the individual image signals, only if the image signal exceeds the threshold level set in the threshold level setter.
Public/Granted literature
- US20080239292A1 Apparatus and method for inspecting defects Public/Granted day:2008-10-02
Information query