Invention Grant
- Patent Title: Lithographic apparatus and control method
- Patent Title (中): 光刻设备及控制方法
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Application No.: US12627097Application Date: 2009-11-30
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Publication No.: US08570490B2Publication Date: 2013-10-29
- Inventor: Benjamin Cunnegonda Henricus Smeets
- Applicant: Benjamin Cunnegonda Henricus Smeets
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/58
- IPC: G03B27/58

Abstract:
A method includes providing a controller to control a speed of a substrate table in a scan direction, the controller including a first input to receive a first signal representative of a first time period of a movement of the substrate table in a step direction, a second input to receive a second signal representative of a distance in the scan direction to be covered by the substrate table during a scan movement thereof, and a third input to receive a third signal representative of an acceleration of the substrate table. The controller includes an output to provide an output signal to control the speed of the substrate table in the scan direction. The method includes calculating the speed of the substrate table in the scan direction from the first, second and third signal, and compensating the output signal for the calculated speed of the substrate table.
Public/Granted literature
- US20100157272A1 LITHOGRAPHIC APPARATUS AND CONTROL METHOD Public/Granted day:2010-06-24
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