Invention Grant
- Patent Title: Forming optical device using multiple mask formation techniques
- Patent Title (中): 使用多种掩模形成技术形成光学器件
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Application No.: US12384094Application Date: 2009-03-30
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Publication No.: US08571362B1Publication Date: 2013-10-29
- Inventor: Po Dong
- Applicant: Po Dong
- Applicant Address: US CA Monterey Park
- Assignee: Mellanox Technologies Ltd.
- Current Assignee: Mellanox Technologies Ltd.
- Current Assignee Address: US CA Monterey Park
- Agency: Gavrilovich, Dodd & Lindsey, LLP
- Main IPC: G02B6/26
- IPC: G02B6/26 ; G02B6/42 ; G02B6/10
Abstract:
An optical device includes a first region interfaced with a second region. The first region includes one or more surfaces that are formed using electron-beam lithography and the second region includes one or more surfaces that are formed using photolithography. A component crosses the interface and includes a first portion located in the first region and a second portion located in the second region. The component includes a light-signal carrying region that constrains light signals. The first portion includes a first taper that expands the light-signal carrying region as the component approaches the interface and the second portion includes a second taper that expands the light-signal carrying region as the component approaches the interface.
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