Invention Grant
- Patent Title: Buffing pad centering system
- Patent Title (中): 抛光垫定心系统
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Application No.: US12518360Application Date: 2007-12-12
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Publication No.: US08572797B2Publication Date: 2013-11-05
- Inventor: Richard Umbrell
- Applicant: Richard Umbrell
- Applicant Address: US CA Rancho Dominguez
- Assignee: Buff and Shine Manufacturing, Inc.
- Current Assignee: Buff and Shine Manufacturing, Inc.
- Current Assignee Address: US CA Rancho Dominguez
- Agency: The Eclipse Group LLP
- International Application: PCT/US2007/087311 WO 20071212
- International Announcement: WO2008/076775 WO 20080626
- Main IPC: A47L11/14
- IPC: A47L11/14 ; B24B29/00

Abstract:
In general, a Buffing Pad Centering System (“BPCS”) for centering a back plate having an edge and a front surface is described. In an example of an implementation of the BPCS, the BPCS may include a centering ring having a top boundary and a bottom boundary and a buffing pad attached to the bottom boundary of the centering ring, where the centering ring is centered on the buffing pad. The centering ring may include a cylindrical vertical member extending between the top boundary and bottom boundary, where the cylindrical vertical member has an inner cylindrical surface and an outer cylindrical surface, and where the inner cylindrical surface is capable of snuggly receiving the back plate.
Public/Granted literature
- US20100144253A1 BUFFING PAD CENTERING SYSTEM Public/Granted day:2010-06-10
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