Invention Grant
- Patent Title: Apparatus for thermal development with supporting surface for a development medium
- Patent Title (中): 用于显影介质支撑表面的热显影装置
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Application No.: US13897505Application Date: 2013-05-20
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Publication No.: US08573120B1Publication Date: 2013-11-05
- Inventor: Mark A Hackler , Anandkumar R Kannurpatti , Robert A McMillen , Todd M Scheske
- Applicant: E.I. du Pont de Nemours and Company
- Applicant Address: US DE Wilmington
- Assignee: E I du Pont de Nemours and Company
- Current Assignee: E I du Pont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- Main IPC: G03F7/34
- IPC: G03F7/34
Abstract:
This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.
Public/Granted literature
- US20130278909A1 APPARATUS FOR THERMAL DEVELOPMENT WITH SUPPORTING SURFACE FOR A DEVELOPMENT MEDIUM Public/Granted day:2013-10-24
Information query
IPC分类:
