Invention Grant
- Patent Title: Arrangement for reflection of heat radiation, process of making same and uses of same
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Application No.: US12493363Application Date: 2009-06-29
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Publication No.: US08573194B2Publication Date: 2013-11-05
- Inventor: Christian Henn , Wolfgang Schmidbauer , Torsten Gabelmann
- Applicant: Christian Henn , Wolfgang Schmidbauer , Torsten Gabelmann
- Applicant Address: DE Mainz
- Assignee: Schott AG
- Current Assignee: Schott AG
- Current Assignee Address: DE Mainz
- Agent Michael J. Striker
- Priority: DE102008030825 20080630
- Main IPC: F24B1/18
- IPC: F24B1/18

Abstract:
The heat reflecting arrangement with an improved high heat resistance, e.g. 100 hours at 500° C., includes a substrate, a heat reflecting layer (A) on at least one side of the substrate, which contains indium tin oxide (ITO), and a barrier layer (B) that covers the heat reflecting layer (A), which contains a metal oxide and/or a metal nitride. A fireplace or baking oven with a viewing window having this layer system with the heat reflecting layer is also described. In addition a process for providing the heat reflecting arrangement is described.
Public/Granted literature
- US20090320824A1 Arrangement for reflection of heat radiation, process of making same and uses of same Public/Granted day:2009-12-31
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