Invention Grant
- Patent Title: Biasing a pre-metalized non-conductive substrate
- Patent Title (中): 偏置预金属化的非导电衬底
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Application No.: US12715144Application Date: 2010-03-01
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Publication No.: US08573579B2Publication Date: 2013-11-05
- Inventor: Chang Bok Yi , Tatsuru Tanaka , Chun Wai Joseph Tong , Hongling Liu , Paul S. McLeod
- Applicant: Chang Bok Yi , Tatsuru Tanaka , Chun Wai Joseph Tong , Hongling Liu , Paul S. McLeod
- Applicant Address: US CA Cupertino
- Assignee: Seagate Technology LLC
- Current Assignee: Seagate Technology LLC
- Current Assignee Address: US CA Cupertino
- Main IPC: B25B5/16
- IPC: B25B5/16

Abstract:
Methods and apparatus are provided for static-biasing a pre-metalized non-conductive substrate within a process chamber. A substrate holder that holds a pre-metalized non-conductive substrate is engaged by a lift mechanism that provides movement of the substrate in a first, upward direction to a contact position within the process chamber and in a second direction to a non-contact position. When the substrate holder is moved to the contact position, the substrate electrically engages a conductive spring-loaded compliance mechanism that is mounted in a fixed position within the process chamber. The spring-loaded compliance mechanism is connected to a bias-voltage feed-through for the process chamber that applies a bias voltage to the substrate via the spring-loaded compliance mechanism.
Public/Granted literature
- US20110212269A1 METHOD AND APPARATUS FOR STATIC BIASING A PRE-METALIZED NON-CONDUCTIVE SUBSTRATE Public/Granted day:2011-09-01
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