Invention Grant
- Patent Title: Method of manufacturing thin film device
- Patent Title (中): 制造薄膜器件的方法
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Application No.: US12467134Application Date: 2009-05-15
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Publication No.: US08574389B2Publication Date: 2013-11-05
- Inventor: Hwan-Soo Lee , Yongsoo Oh
- Applicant: Hwan-Soo Lee , Yongsoo Oh
- Applicant Address: KR Suwon, Gyunggi-do
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon, Gyunggi-do
- Agency: McDermott Will & Emery LLP
- Priority: KR10-2008-0086470 20080902
- Main IPC: B32B38/10
- IPC: B32B38/10

Abstract:
A method of manufacturing a thin film device according to an aspect of the invention may include: preparing a substrate on which a sacrificial layer and a thin film to be transferred are sequentially formed; temporarily bonding the thin film to a circumferential surface of the transfer roll, and simultaneously removing the sacrificial layer to separate the thin film from the substrate at a first position of a transfer roll that is rolling; and transferring the thin film onto a sheet by running the sheet so that a surface of the sheet is bonded to the thin film temporarily bonded to the circumferential surface of the transfer roll.The substrate may be a transparent substrate.
Public/Granted literature
- US20100051191A1 METHOD OF MANUFACTURING THIN FILM DEVICE Public/Granted day:2010-03-04
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